[PDF.71jj] Sub-Half-Micron Lithography for ULSIs (Cambridge Studies in Semiconductor Physics & Microelectronic Engineering)

Sub-Half-Micron Lithography for ULSIs (Cambridge Studies in Semiconductor Physics & Microelectronic Engineering)

[PDF.lq49] Sub-Half-Micron Lithography for ULSIs (Cambridge Studies in Semiconductor Physics & Microelectronic Engineering)

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 | #6330790 in Books |  Cambridge University Press |  2000-06-26 | Original language:English | PDF # 1 |  9.69 x.98 x7.44l,2.10 | File type: PDF | 342 pages

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In semiconductor-device fabrication processes, lithography technology is used to print circuit patterns on semiconductor wafers. The remarkable miniaturization of semiconductor devices has been made possible only because of the continuous progress in lithography technology. However, for the trend of ever-increasing miniaturization to continue, a breakthrough in lithography technology is now needed. This book describes advanced techniques under development that represent...

You can specify the type of files you want, for your device.Sub-Half-Micron Lithography for ULSIs (Cambridge Studies in Semiconductor Physics & Microelectronic Engineering)   |  From Brand: Cambridge University Press. A good, fresh read, highly recommended.

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